Temperature dependence of the sticking coefficients of bis-diethyl aminosilane and trimethylaluminum in atomic layer deposition

dc.contributor.author	Oettel, Martin
dc.date.accessioned	2018-03-27T08:54:03Z
dc.date.available	2018-03-27T08:54:03Z
dc.date.issued	2017
dc.identifier.issn	1520-8559
dc.identifier.uri	http://hdl.handle.net/10900/81152
dc.language.iso	en	de_DE
dc.publisher	A V S Amer Inst Physics	de_DE
dc.relation.uri	http://dx.doi.org/10.1116/1.4971197	de_DE
dc.rights	info:eu-repo/semantics/closedAccess
dc.subject.ddc	530	de_DE
dc.subject.ddc	600	de_DE
dc.title	Temperature dependence of the sticking coefficients of bis-diethyl aminosilane and trimethylaluminum in atomic layer deposition	de_DE
dc.type	Article	de_DE
utue.quellen.id	20170815222223_02439
utue.personen.roh	Schwille, Matthias C.
utue.personen.roh	Schoessler, Timo
utue.personen.roh	Schoen, Florian
utue.personen.roh	Oettel, Martin
utue.personen.roh	Bartha, Johann W.
dcterms.isPartOf.ZSTitelID	Journal of Vacuum Science & Technology A	de_DE
dcterms.isPartOf.ZS-Issue	Article 01B119	de_DE
dcterms.isPartOf.ZS-Volume	35	de_DE
utue.fakultaet	07 Mathematisch-Naturwissenschaftliche Fakultät	de_DE