Temperature dependence of the sticking coefficients of bis-diethyl aminosilane and trimethylaluminum in atomic layer deposition

DSpace Repository

Temperature dependence of the sticking coefficients of bis-diethyl aminosilane and trimethylaluminum in atomic layer deposition

Author: Schwille, Matthias C.; Schoessler, Timo; Schoen, Florian; Oettel, Martin; Bartha, Johann W.
Tübinger Autor(en):
Oettel, Martin
Published in: Journal of Vacuum Science & Technology A (2017), Bd. 35, Article 01B119
Verlagsangabe: A V S Amer Inst Physics
Language: English
Full text: http://dx.doi.org/10.1116/1.4971197
ISSN: 1520-8559
DDC Classifikation: 530 - Physics
600 - Technology
Dokumentart: Article
Show full item record

This item appears in the following Collection(s)