The Crucial Role of Confined Residual Additives on the Photostability of P3HT:PCBM Active Layers

dc.contributor.author	Peisert, Heiko
dc.contributor.author	Chassé, Thomas
dc.contributor.author	Tournebize, Aurélien
dc.date.accessioned	2015-12-04T10:22:21Z
dc.date.available	2015-12-04T10:22:21Z
dc.date.issued	2015
dc.identifier.issn	1932-7447
dc.identifier.uri	http://hdl.handle.net/10900/66863
dc.language.iso	en	en
dc.publisher	Amer Chemical Soc	de_DE
dc.relation.uri	http://dx.doi.org/10.1021/acs.jpcc.5b01733	de_DE
dc.rights	info:eu-repo/semantics/closedAccess
dc.subject.ddc	540	de_DE
dc.subject.ddc	600	de_DE
dc.title	The Crucial Role of Confined Residual Additives on the Photostability of P3HT:PCBM Active Layers	de_DE
dc.type	Article	de_DE
utue.quellen.id	20150901145020_00961
utue.publikation.seiten	9142-9148	de_DE
utue.personen.roh	Tournebize, Anrelien
utue.personen.roh	Rivaton, Agnes
utue.personen.roh	Peisert, Heiko
utue.personen.roh	Chasse, Thomas
dcterms.isPartOf.ZSTitelID	Journal of Physical Chemistry C	de_DE
dcterms.isPartOf.ZS-Issue	17	de_DE
dcterms.isPartOf.ZS-Volume	119	de_DE
utue.fakultaet	07 Mathematisch-Naturwissenschaftliche Fakultät	de_DE