A comprehensive calibration of integrated magnetron sputtering and plasma enhanced chemical vapor deposition for rare-earth doped thin films

dc.contributor.author	Wolz, Lukas
dc.date.accessioned	2024-10-30T10:35:28Z
dc.date.available	2024-10-30T10:35:28Z
dc.date.issued	2024
dc.identifier.issn	0884-2914
dc.identifier.uri	http://hdl.handle.net/10900/158595
dc.language.iso	en	en
dc.publisher	Heidelberg : Springer Heidelberg	de_DE
dc.relation.uri	http://dx.doi.org/10.1557/s43578-023-01207-2
dc.subject.ddc	600	de_DE
dc.title	A comprehensive calibration of integrated magnetron sputtering and plasma enhanced chemical vapor deposition for rare-earth doped thin films	de_DE
dc.type	Article	de_DE
utue.quellen.id	20240422000000_01356
utue.publikation.seiten	150-164	de_DE
utue.personen.roh	Khatami, Zahra
utue.personen.roh	Wolz, Lukas
utue.personen.roh	Wojcik, Jacek
utue.personen.roh	Mascher, Peter
dcterms.isPartOf.ZSTitelID	Journal of Materials Research	de_DE
dcterms.isPartOf.ZS-Issue	1	de_DE
dcterms.isPartOf.ZS-Volume	39	de_DE
utue.fakultaet	Universität Tübingen (ohne Fakultätsangabe)