Long-Term Degradation Mechanisms in Application-Implemented Radical Thin Films

dc.contributor.author	Glaser, Mathias
dc.contributor.author	Nowik Boltyk, Ewa
dc.contributor.author	Junghöfer, Tobias
dc.contributor.author	Casu, Maria Benedetta
dc.date.accessioned	2024-10-22T06:47:16Z
dc.date.available	2024-10-22T06:47:16Z
dc.date.issued	2023
dc.identifier.issn	1944-8244
dc.identifier.uri	http://hdl.handle.net/10900/158425
dc.language.iso	en	de_DE
dc.publisher	Washington : Amer Chemical Soc	de_DE
dc.relation.uri	http://dx.doi.org/10.1021/acsami.3c02057	de_DE
dc.subject.ddc	600	de_DE
dc.title	Long-Term Degradation Mechanisms in Application-Implemented Radical Thin Films	de_DE
dc.type	Article	de_DE
utue.quellen.id	20230928000000_00834
utue.publikation.seiten	30935-30943	de_DE
utue.personen.roh	Nowik-Boltyk, Ewa Malgorzata
utue.personen.roh	Junghoefer, Tobias
utue.personen.roh	Glaser, Mathias
utue.personen.roh	Giangrisostomi, Erika
utue.personen.roh	Ovsyannikov, Ruslan
utue.personen.roh	Zhang, Shuyang
utue.personen.roh	Shu, Chan
utue.personen.roh	Rajca, Andrzej
utue.personen.roh	Calzolari, Arrigo
utue.personen.roh	Casu, M. Benedetta
dcterms.isPartOf.ZSTitelID	Acs Applied Materials & Interfaces	de_DE
dcterms.isPartOf.ZS-Issue	25	de_DE
dcterms.isPartOf.ZS-Volume	15	de_DE
utue.fakultaet	07 Mathematisch-Naturwissenschaftliche Fakultät	de_DE