Long-Term Degradation Mechanisms in Application-Implemented Radical Thin Films

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Long-Term Degradation Mechanisms in Application-Implemented Radical Thin Films

Author: Nowik-Boltyk, Ewa Malgorzata; Junghoefer, Tobias; Glaser, Mathias; Giangrisostomi, Erika; Ovsyannikov, Ruslan; Zhang, Shuyang; Shu, Chan; Rajca, Andrzej; Calzolari, Arrigo; Casu, M. Benedetta
Tübinger Autor(en):
Glaser, Mathias
Nowik Boltyk, Ewa
Junghöfer, Tobias
Casu, Maria Benedetta
Published in: Acs Applied Materials & Interfaces (2023), Bd. 15, H. 25, S. 30935-30943
Verlagsangabe: Washington : Amer Chemical Soc
Language: English
Full text: http://dx.doi.org/10.1021/acsami.3c02057
ISSN: 1944-8244
DDC Classifikation: 600 - Technology
Dokumentart: Article
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