Ion- and temperature-induced 3-dimensional nanoscale patterning in Ti1-xAlxN deposited by High Power Impulse Magnetron Sputtering
Author:
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Warres, Clementine; Meyer, J. C.; Lutz, T.; Albrecht, P.; Engelhart, W.; Schroeppel, B.; Kuemmel, J.
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Tübinger Autor(en):
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Published in:
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Thin Solid Films
(2023), Bd.
781,
Article 139977
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Verlagsangabe:
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Lausanne : Elsevier Science Sa
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Language:
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English
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Full text:
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http://dx.doi.org/10.1016/j.tsf.2023.139977
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ISSN:
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0040-6090
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DDC Classifikation:
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600 - Technology 530 - Physics
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Dokumentart:
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Article
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