Magnetic behavior in metal-free radical thin films

dc.contributor.author	Glaser, Mathias
dc.contributor.author	Ciccullo, Francesca
dc.contributor.author	Casu, Maria Benedetta
dc.contributor.author	Junghöfer, Tobias
dc.date.accessioned	2022-12-01T07:28:46Z
dc.date.available	2022-12-01T07:28:46Z
dc.date.issued	2022
dc.identifier.issn	2451-9294
dc.identifier.uri	http://hdl.handle.net/10900/133471
dc.language.iso	en	de_DE
dc.publisher	Cell Press	de_DE
dc.relation.uri	http://dx.doi.org/10.1016/j.chempr.2021.11.021	de_DE
dc.subject.ddc	540	de_DE
dc.title	Magnetic behavior in metal-free radical thin films	de_DE
dc.type	Article	de_DE
utue.quellen.id	20220728000000_01638
utue.publikation.seiten	801-814	de_DE
utue.personen.roh	Junghoefer, Tobias
utue.personen.roh	Calzolari, Arrigo
utue.personen.roh	Baev, Ivan
utue.personen.roh	Glaser, Mathias
utue.personen.roh	Ciccullo, Francesca
utue.personen.roh	Giangrisostomi, Erika
utue.personen.roh	Ovsyannikov, Ruslan
utue.personen.roh	Kielgast, Fridtjof
utue.personen.roh	Nissen, Matz
utue.personen.roh	Schwarz, Julius
utue.personen.roh	Gallagher, Nolan M.
utue.personen.roh	Rajca, Andrzej
utue.personen.roh	Martins, Michael
utue.personen.roh	Casu, Maria Benedetta
dcterms.isPartOf.ZSTitelID	Chem	de_DE
dcterms.isPartOf.ZS-Issue	3	de_DE
dcterms.isPartOf.ZS-Volume	8	de_DE
utue.fakultaet	07 Mathematisch-Naturwissenschaftliche Fakultät	de_DE