Fabrication Process for Deep Submicron SQUID Circuits with Three Independent Niobium Layers

dc.contributor.author	Linek, Julian
dc.contributor.author	Kleiner, Reinhold
dc.contributor.author	Kölle, Dieter
dc.date.accessioned	2021-12-20T15:31:40Z
dc.date.available	2021-12-20T15:31:40Z
dc.date.issued	2021
dc.identifier.issn	2072-666X
dc.identifier.uri	http://hdl.handle.net/10900/121926
dc.language.iso	en	de_DE
dc.publisher	Mdpi	de_DE
dc.relation.uri	http://dx.doi.org/10.3390/mi12040350	de_DE
dc.subject.ddc	530	de_DE
dc.subject.ddc	540	de_DE
dc.subject.ddc	600	de_DE
dc.title	Fabrication Process for Deep Submicron SQUID Circuits with Three Independent Niobium Layers	de_DE
dc.type	Article	de_DE
utue.quellen.id	20210824232002_01677
utue.personen.roh	Wolter, Silke
utue.personen.roh	Linek, Julian
utue.personen.roh	Altmann, Josepha
utue.personen.roh	Weimann, Thomas
utue.personen.roh	Bechstein, Sylke
utue.personen.roh	Kleiner, Reinhold
utue.personen.roh	Beyer, Jorn
utue.personen.roh	Koelle, Dieter
utue.personen.roh	Kieler, Oliver
dcterms.isPartOf.ZSTitelID	Micromachines	de_DE
dcterms.isPartOf.ZS-Issue	Article 350	de_DE
dcterms.isPartOf.ZS-Volume	12	de_DE
utue.fakultaet	07 Mathematisch-Naturwissenschaftliche Fakultät	de_DE