Experimental and simulation approach for process optimization of atomic layer deposited thin films in high aspect ratio 3D structures

Author:

Schwille, Matthias C.; Schoessler, Timo; Barth, Jonas; Knaut, Martin; Schoen, Florian; Hoechst, Arnim; Oettel, Martin; Bartha, Johann W.

Tübinger Autor(en):

Published in:

Journal of Vacuum Science & Technology A (2017), Bd. 35, Article 01B118

Verlagsangabe:

A V S Amer Inst Physics

Language:

English

Full text:

ISSN:

1520-8559

DDC Classifikation:

530 - Physics
600 - Technology

Dokumentart:

Article

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